First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...
(a) Unit optimization process with a hybrid continuous-discrete PSO algorithm. The particulars of the yellow and green boxes in the optimization are elaborated in (b) and (c), respectively. (b) The ...
Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
Just when you think you’ve learned all the latest 3D printing tricks, [TenTech] shows up with an update to their Fuzzyficator post-processing script. This time, the GPL v3 licensed program has gained ...
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