Modeling a fin pitch walk based on a process flow simulation to assess impact on various self-aligned quadruple patterning process steps. In this paper, we model fin pitch walk based on a process flow ...
In the realm of novel micro/nano-electronics manufacturing, the massive integration of microchips (such as MicroLEDs) onto heterogeneous substrates is essential for realizing high-performance displays ...
As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...
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