As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Experienced Java developers are committed to continuous improvement. We always seek ways to make our code more readable, reliable and efficient. Java's evolution provides a steady stream of powerful ...